Development of Coating Technology for Crystalline Silicon Solar Cells
Time：
2023-07-31 09:54
The development direction of crystalline silicon battery technology includes PERT technology and Topcon technology, which are regarded as extensions of traditional diffusion method battery technology. Their common feature is that there is a passivation layer on the back of the battery, and both use a layer of doped polycrystalline silicon as the back field. The passivation layer mostly adopts high-temperature oxidation layer, while the doped polycrystalline silicon layer adopts methods such as LPCVD and PECVD. Tubular PECVD and flat PECVD have been used in large-scale production of PERC batteries.
Tubular PECVD has a large production capacity and generally uses a low-frequency power supply of tens of kilohertz. Ion bombardment and coating problems may affect the quality of the passivation layer. The flat PECVD has no coating problem and has significant advantages in coating performance, which can be used for the deposition of doped Si, SiO, and SiC films. The disadvantage is that the deposited film contains a large amount of hydrogen, which can easily cause bubbles in the film layer and limit the coating thickness. When LPCVD coating technology adopts tube furnace coating
With large production capacity, it can
Deposition of thicker polycrystalline silicon films may occur, but there may also be wrapping. After the LPCVD process, the coating layer must be removed without damaging the underlying layer. The mass-produced Topcon battery has achieved an average conversion efficiency of 23%.
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2026-09-28
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