Vacuum ion coating machines and their classification
Time：
2023-07-31 09:53
Vacuum ion plating machine (referred to as ion plating) is a brand new surface treatment technology proposed by D. MMaftox of Somdia Company in the United States in 1963, which was rapidly developed in the 1970s. It refers to the process of using an evaporation source or sputtering target in a vacuum atmosphere to evaporate or sputter the film material. A portion of the evaporated or sputtered particles ionize into metal ions in the gas discharge space, and these particles deposit onto the substrate under the action of an electric field to form a thin film.
At present, there are many types of vacuum ion plating films, which are usually divided into two types based on the ion sources generated by the film material: evaporation source ion plating and sputtering target ion plating. The former generates metal vapor through heating and evaporation of the membrane material, causing it to partially ionize into metal vapor and high-energy neutral atoms in the space of gas discharge plasma, and generate a thin film on the substrate through the action of an electric field; The latter uses high-energy ions (such as Ar+) to bombard the surface of the film material, causing the sputtered particles to ionize into ions or high-energy neutral atoms through the space of gas discharge, reaching the surface of the substrate and generating a thin film.
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2026-09-28
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