With the effective gas for separation in the sputtering vacuum chamber, each target unit can be adjustable according to the different technic neatly , guarantee the steady and even vacuum gas in the sputtering section.
The process adopt PLC control, DC power supply, AC midfrequency sputtering power supply, transducer and other subassembly are famous imported brand. Control interface adopt INSPEC configuration monitor system to display the production and carry out the operation. All the production is monitored and controlled by online computer.
Adopt advanced twin-targets techniques and PEM closed loop control technology, online test system, to collect the reflective spectrum data and curve of each sputtering layer quickly.
To control the sputtering processing effectively, and to increase the deposition efficiency of the medium film(TIO2,SIO2,SI3N4).
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